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Mohan et al. (pp. 1826–1830) have performed a parametric study on the synthesis of silicon nanoparticles (NPs) in the gas phase in a capacitively coupled VHF discharge as a function of crystalline ratio. One of the less studied parameters for NP growth is the inter‐electrode distance, d. The authors' results indicate that the optimum parameter space for the growth of nanoparticles with improved morphology...
Various plasma process parameters such as coupled power, process pressure (p), gas flow, and source gas ratios (SiH4:H2) play crucial roles in determining the size and crystallinity of the synthesized Si nanoparticles (NPs). One of the less studied parameters for NP growth is the inter‐electrode distance, d. Our study focuses on the effect of d and demonstrates how a reactor with larger d (refers...
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