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Applied Materials' funnel-shaped electrode configuration for remote plasma process is being used for oxide removals in semiconductor manufacturing process. Remote plasma removal process actively uses chemically activated species from plasma rather than charged particles that could possibly damage the structures fabricated on the wafer.
A remote plasma source for selective removal process in semiconductor device fabrication has been investigated. Plasma has been generated between the cone-shaped electrode powered by commercial electronic ballast and the grounded plane electrode with noble gases of argon, helium or a mixture gas of He+NF3+NH3 for the pressure range from 1 Torr to 30 Torr. Sinusoidal voltage waveform and asymmetry...
An argon plasma generated between the cone-shaped electrode powered by commercial electronic ballast and grounded plane electrode has been investigated. Since the electronic ballast has positive and negative cycle in a period, two different discharge modes of remote plasma—the normal glow discharge mode and the hollow cathode discharge mode—have been observed. It is noted that the hollow cathode discharge...
Summary form only given. A plasma display panel (PDP) is one of the best candidates for a large-scale flat panel display using plasma technology for high definition TV. The gas mixture ratio of PDP discharge plays a very important role in several issues in AC PDP researches such as lowering operating voltage for cost reduction, increasing voltage margin for stable operation, and enhancing brightness...
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