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This paper presents an innovative technique of integrating silica nanowires to photoresist-derived carbon microelectromechanical systems (C-MEMS) on silicon substrate. The silica nanowires were synthesized through thermal treatment in a tube furnace at 1200 °C under a gaseous environment of N2 and H2. The stiff morphology and radicalized distribution around carbon posts of nanowires was observed,...
A real-time exposure dose control algorithm for deep ultraviolet (DUV) excimer lasers in a step-and-scan optical lithography is presented. By establishing an abstract scan exposure model and analyzing the pulse-to-pulse energy fluctuation characteristics of DUV excimer lasers, a real-time dose regulation is implemented based on closed-loop feedback control, which especially focuses on reducing the...
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