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This work uses ultrasonic spray pyrolysis deposition to grow titanium dioxide and aluminum oxide (Al2O3) films, respectively, as an active layer and an insulator layer of the metal–insulator–semiconductor–insulator–metal (MISIM) photodetector (PD). 10-, 20-, and 30-nm-thick Al2O3 films were deposited and the $I$ –$V$ characteristics in the dark and under illumination were measured and investigated...
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