The Infona portal uses cookies, i.e. strings of text saved by a browser on the user's device. The portal can access those files and use them to remember the user's data, such as their chosen settings (screen view, interface language, etc.), or their login data. By using the Infona portal the user accepts automatic saving and using this information for portal operation purposes. More information on the subject can be found in the Privacy Policy and Terms of Service. By closing this window the user confirms that they have read the information on cookie usage, and they accept the privacy policy and the way cookies are used by the portal. You can change the cookie settings in your browser.
In this work, we design and simulate a doping-less normally OFF/enhancement mode GaN based MOSFET. The novelty of the device is that it uses the charge plasma concept to induce n type charge plasma in an undoped GaN film, by employing metal electrodes, to realize source and drain regions of a GaN MOSFET. The proposed device is not a hetero-structure device, like the conventional GaN/AlGaN MOSFET and...
Set the date range to filter the displayed results. You can set a starting date, ending date or both. You can enter the dates manually or choose them from the calendar.