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A new MEMS process based on amorphous metal alloys has been developed. The alloy in question is sputter-deposited molybdenum–silicon–nitrogen (Mo–Si–N) with atomic composition of 31at% Mo, 20at% Si, 45at% N and 4at% O and tensile residual stress of 300MPa. This surface micromechanical process has been used for fabrication of variable capacitors for microwave and millimetre wave applications. The devices...
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