The Infona portal uses cookies, i.e. strings of text saved by a browser on the user's device. The portal can access those files and use them to remember the user's data, such as their chosen settings (screen view, interface language, etc.), or their login data. By using the Infona portal the user accepts automatic saving and using this information for portal operation purposes. More information on the subject can be found in the Privacy Policy and Terms of Service. By closing this window the user confirms that they have read the information on cookie usage, and they accept the privacy policy and the way cookies are used by the portal. You can change the cookie settings in your browser.
A novel approach to wet etching of silicon wafers (100) is described in this study. Homogenous organized surface structures were prepared by the utilization of self-organized flow in the etching solution (Bénard-Marangoni thermocapillar instability). The driving force behind this process is a temperature gradient generated by the etching apparatus exclusively constructed for this research. The influences...