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We report on a photolithographic and electro‐deposition process that results in an optimized front grid structure for high efficiency multi‐junction III–V concentrator solar cells operating under flux concentrations up to 1000 suns. Two different thick photoresists were investigated to achieve a 6 µm wide grid line with an aspect ratio of 1:1. A positive photoresist, SPR220 manufactured by Rohm and...
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