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GaN/AlN two-layer films with different thickness are synthesized on Si substrates by pulsed laser deposition (PLD). GaN and AlN single-layer films are also synthesized for comparison. It is found that the turn-on field of the GaN/AlN two-layer films are considerably decreased 2 orders of magnitude than that of single-layer films. The improvement of FE characteristics an attributed to the quantum structure...
Amorphous gallium nitride (a-GaN) films with thicknesses of 5 and 300 nm are deposited on n-Si (100) substrates by pulsed laser deposition (PLD), and their field emission (FE) properties are studied. It shows that compared with thicker (300 nm) a-GaN film, better FE performance is obtained on ultrathin (5 nm) a-GaN film with a threshold field of 0.78 V/µm, which is the lowest value ever reported....
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