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Silicon nitride-silicon oxynitride in situ composites were fabricated by plane-strain-compressing dense silicon nitrides, starting from 93 wt.% ultrafine β-Si 3 N 4 and 7 wt.% cordierite, at 1600 o C under a constant load of 40 MPa and subsequent annealing at 1750 o C for 30 min. The resulting composites featured a microstructure of elongated Si 2 N 2 ...
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