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Nitrogen incorporated tungsten oxide (WO 3 ) films were grown by reactive magnetron sputter-deposition by varying the nitrogen content in the reactive gas mixture keeping the deposition temperature fixed at 400°C. The crystal structure, surface morphology, chemical composition, and electrical resistivity of nitrogen doped WO 3 films were evaluated using X-ray diffraction (XRD), X-ray...
Cadmium sulfide (CdS) films have been produced by sputter-deposition varying the sputtering-power (P) in the range of 60–120W. The crystal structure, morphology and chemical quality of the CdS films has been investigated employing X-ray diffraction (XRD), scanning electron microscopy (SEM), X-ray photoelectron spectroscopy (XPS), and X-ray spectrometry (EDS). Structural characterization indicates...
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