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The low-frequency (LF) noise behaviour of pMOSFETs fabricated in strained Ge (sGe) and reference thick Ge-on-Si epitaxial layers has been compared. As is shown, the LF noise in the subthreshold regime is higher for the reference devices compared with the sGe, while in strong inversion, similar noise levels are achieved. The better noise performance in weak inversion is related to the lower density...
The impact on the reliability of capping layers for low Vt nMOS and pMOS high-k transistors with metal gate is investigated and devices without the resist and strip process are compared to different resist removal recipes. It is found that the interface is not affected by the cap layer, but during the resist removal a thin defect layer is created. While with the cap above the host dielectric the impact...
We demonstrate that for aggressively scaled FinFETs, with 2nm HfO 2 and TiN metal gate (i.e., workfunction close to midgap), several parasitic leakage mechanisms that impact the off-state current become dominant. We provide a detailed characterization of these mechanisms as well as design guidelines for eliminating them by careful junction dopant placement and S/D silicide engineering in order to...
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