A capacitive single-chip silicon microphone with very low-stress polysilicon membrane was fabricated. A mechanism for stress-releasing due to the high stress of the perforated membrane was introduced. With the achieved stress level of 2 MPa, a microphone with the membrane area of 1 mm 2 can be optimally designed, although the measured components did not show the optimal resolution due to excessive...
Financed by the National Centre for Research and Development under grant No. SP/I/1/77065/10 by the strategic scientific research and experimental development program:
SYNAT - “Interdisciplinary System for Interactive Scientific and Scientific-Technical Information”.