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Transparent and conducting gallium (Ga) and fluorine (F) codoped ZnO (GFZO) thin films were deposited on glass substrates by RF magnetron sputtering in CF4/Ar atmosphere with a ZnO:Ga2O3 (3 wt%) target. The influence of post-deposition annealing temperature on the structural, electrical, and optical properties of GFZO thin films was investigated. XRD results indicated that all the films were polycrystalline...
Ti-doped ZnO (TZO) thin films were prepared by radio frequency magnetron sputtering with a target containing 1.5 wt% TiO 2 on glass substrates at 300 °C and then thermally annealed in a hydrogen ambient. The structural, electrical, and optical properties of TZO films were investigated with respect to the variation of film thickness and annealing condition. X-ray diffraction analysis exhibited...
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