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Titanium dioxide thin films have been deposited on silicon (100) and 316L stainless steel substrates by cathodic arc deposition in oxygen atmosphere with a titanium cathode. The process was run at room temperature and at 300°C, biasing the substrate with pulsed voltage (up to –10kV) and DC voltage (up to –120V). The crystalline structure was studied by Raman spectroscopy and X-ray diffraction. At...