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Cu was deposited on a self-assembled monolayer of a 3-mercaptopropyltrimethoxysilane (MPTMS)-coated glass substrate by chemical vapor deposition (CVD) at temperatures ≤160 °C using (hfac)Cu(DMB) as a precursor. During deposition, there was an induction period for the Cu metal to nucleate on the MPTMS monolayer. This was attributed to the low mobility of Cu on the MPTMS surface in the low temperature...
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