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Several polymers were tested for an application of laser ablation as an alternative to photolithography. Tailored specialty polymers revealed the highest sensitivity to laser ablation. The most sensitive polymers are based on the photolabile triazene chromophore (NNN) which is unfortunately also sensitive to other processing steps, e.g. wet etching. Polymers with a cinnamylidenemalonic acid ester...
Abstract. Novel photopolymers containing side groups based on o-methoxycinnamylidenemalonic acid, which undergo selective photo-crosslinking without destruction of the polymer backbone upon irradiation at 395nm, have been developed for potential applications as combined positive-negative resists and multilayer resists. An XeCl excimer laser (=308nm, =20ns) was used as the irradiation source to study...
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