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The microstructural development of thin (thickness<10nm) oxide layers grown on Zr surfaces by thermal oxidation was investigated by in-vacuo STM and XPS. To this end, single-crystalline Zr(0001) and Zr(101¯0) surfaces were prepared under UHV conditions by a cyclic treatment of ion-sputtering and in-vacuo annealing steps and then exposed to dry O 2 (g) in the temperature range of 300–450K...
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