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SU-8 is an epoxy-based, negative photoresist that is widely used in the manufacturing of micromechanical systems. The polymer cross-linking that occurs during the photolithographic processing of SU-8 can result in high levels of stress in the patterned film. This has significant implications for the yield and reliability of SU-8 structures and needs to be understood if the material is to be integrated...
SU-8, an epoxy based negative photoresist, is widely used in the manufacture of micromechanical systems but can exhibit significant levels of stress build-up during processing. This paper describes micromechanical test structures that provide the opportunity to spatially characterise stress the in SU-8 at different stages of the process. The structures are fabricated in a thick layer of SU-8 and are...
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