The Infona portal uses cookies, i.e. strings of text saved by a browser on the user's device. The portal can access those files and use them to remember the user's data, such as their chosen settings (screen view, interface language, etc.), or their login data. By using the Infona portal the user accepts automatic saving and using this information for portal operation purposes. More information on the subject can be found in the Privacy Policy and Terms of Service. By closing this window the user confirms that they have read the information on cookie usage, and they accept the privacy policy and the way cookies are used by the portal. You can change the cookie settings in your browser.
We successfully achieved the reduction of the parasitic resistance and the mobility enhancement in Si nanowire transistors (NW Tr.) by raised source/drain extensions with thin spacer (<;10nm) and by stress induced from heavily-doped gate. Id variations are suppressed by the spacer thinning. By adopting <;100> NW channel instead of <;110> NW, Ion = 1 mA/μm for Ioff = 100 nA/μm is achieved...
We present a systematic study of uniaxial/biaxial stress effects on low-field mobility and on-current in high-kappa n/pFETs. It is found that mobility enhancement by strain in high-kappa FETs is smaller than SiO2 FETs in low effective field because of remote Coulomb scattering caused by fixed charges inside high-kappa films, while mobility enhancement by biaxial tensile strain in high-kappa nFETs...
Carrier transport in advanced MOSFETs is reviewed. First, electron and hole mobility in (110) MOSFETs are compared with those in (100) MOSFETs. Stress engineering is discussed in terms of energy split and effective mass due to the stress. The optimization of multi-gate MOSFET structure is then considered. As an example of ballistic MOSFETs, the performance and stress engineering of CNT FETs with doped...
Random telegraph noise (RTN) in scaled FETs is one of the biggest concerns in the present and future LSIs. However, RTN in high-kappa gate dielectric FETs have not been fully studied yet. In this paper, we have studied RTN in high-kappa pFETs in comparison with that in SiO2 pFETs. It is found for the first time that the reduction of the RTN amplitude (DeltaId/Id) by the surface holes is smaller in...
In this paper, the first systematic study of uniaxial stress effects on mobility (mu)/on-current (Ion) enhancement and gate current (Ig) reduction in FinFETs is described. We demonstrate for the first time that Ig of (110) side-surface pFinFETs is largely reduced by longitudinal compressive stress due to out-of-plane mass increase. (110) n/pFinFETs are superior to (100) FinFETs in terms of higher...
Set the date range to filter the displayed results. You can set a starting date, ending date or both. You can enter the dates manually or choose them from the calendar.