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AbstractThe precision of transferred patterns are highly dependent on the quality of the mask in deep x-ray lithography. Many parameters, such as the critical energy of the synchrotron light, beamline optics and even the microstructure to be exposed should be considered in mask design. In this paper, the design rules and the boundary conditions for deep x-ray mask are discussed in general. The method...
AbstractThis paper describes the micromachining program status of the micromachining laboratory at the SRRC. A preliminary LIGA process has been established. Many joint projects with local and foreign institutes to develop devices for domestic industries have been started. The interests in the application of the LIGA technology is continuously growing in Taiwan. Two-millimeter ultra-deep microstructures...
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