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This paper reports a theoretical and experimental study of a MEMS injection-locked laser (ILL). The micromachined injection-locked laser consists of a MEMS tunable laser (master) and a Fabry-Perot multimode laser (slave) that is integrated by using deep RIE processes onto a single chip. Based on the experimental results, hysteresis property in asymmetrical tuning curve is observed and optical bistability...
This paper presents a micromachined tunable laser that utilizes a silicon optical tunneling structure to tune both the polarization state and the wavelength of the laser output. The device is fabricated on silicon-on-insulator wafer using deep reactive ion etching. In experiment, the wavelength and the polarization are tuned by heating up the silicon optical tunneling structure via the thermo-optic...
Experimental and modeling studies concerning the etching of InP by chlorine plasma have been achieved. Chlorine plasma discharge has been analyzed using Langmuir probe. The latter allows to measure the electron density and temperature as a function of ICP reactor parameters such as RF power, chlorine flow rate and pressure. These two parameters play a crucial role in the modeling of plasma etch process...
Several structures produced by dry etching of InP substrates are studied. RIE (Reactive Ion Etching) and ICP (Inductively Coupled Plasma) dry etching procedures were compared. The characterization was carried out by spectrum imaging Cathodoluminescence (CL). The main changes induced by both procedures in the InP substrates were studied. In particular, the creation of defects and the generation of...
InP wafers after etching in an ICP (Inductively-Coupled Plasma) reactor with different kinds of reactant gases have been carefully studied using surface sensitive techniques, in order to gain insight into the mechanisms that control the process. Two types of reactive gas systems have been investigated, namely Cl2/CH4/Ar mixtures on one side, and CH4/H2 on the other. In both cases, the composition...
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