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Transparent and conductive thin films of indium tin oxide were fabricated on glass substrates by the thermal evaporation technique. Tin doped indium ingots with low tin content were evaporated in vacuum (1.33 × 10−7 kpa) followed by an oxidation for 15 min in the atmosphere in the temperature range of 600–700°C. The structure and phase purity, surface morphology, optical and electrical properties...
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