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Crystalline-silicon-nanocluster-embedded silicon nitride films were deposited at low temperature using a laser-assisted CVD (LACVD) system with various reactant gas flow rates and assisting laser power densities. The photoluminescence (PL) performances of the resultant films were studied, showing a systematic spectra blue shift, and the enhancement of PL intensity with the increase of the reactant...
SiGe based metal-oxide-semiconductor field-effect transistors (MOSFETs) were fabricated, in which the SiGe channel layer was deposited by using laser-assisted plasma-enhanced chemical vapor deposition (LAPECVD) system. The characteristics were compared with the device without laser assistance.
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