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Novel ion source for the production of extended ribbon beams Thomas N. Horsky*, Sami K. Hahto, and Tetsuro Yamamoto Nissin Ion Equipment USA, 34 Sullivan Road Suite 21, North Billerica, MA 01862, USA *Tom.Horsky@nissin-ion.com We describe a new ion source developed for a commercial high current ion implanter. The source generates a "ribbon beam" about 300 mm high and 25 mm wide, and produces...
We present here the substitutional carbon dependence of ClusterCarbon implant energy and dose, and anneal parameters such as solid phase epitaxial regrowth (SPER) temperature and various high temperature millisecond flash anneal conditions. With a multiple implant sequence of carbon implants one can obtain a fairly uniform carbon profile and we show that it provides better carbon substitution [C]...
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