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Double patterning lithography (DPL) provides an attractive alternative or a supplementary method to enable the 32 nm and 22 nm process nodes, relative to costlier technology options such as high refractive index materials, extreme ultraviolet (EUV), or e-beam lithography. DPL implements patterns on a single layer using either additional masks (e.g., double exposure or double patterning) or many additional...
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