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To meet the strong need for highly efficient and controllable manufacturing methods to ceramic nanofiltration (NF) membranes, we use atomic layer deposition (ALD) to prepare NF membranes by tightening ultrafiltration (UF) membranes. We confine the ALD deposition of TiO2 to the near‐surface region of substrate UF membranes. The pores (∼5 nm) in the selective layers are progressively reduced, thus transforming...
Atomic layer deposition (ALD) of polyimide (PI) is explored to tune the separation properties of microporous polyethersulfone (PES) membranes and also to improve their mechanic and thermal stability. Conformal and uniform thin layers of PI are deposited along the pore wall throughout the entire PES membrane instead of forming a top layer merely on the membrane surface. With increasing ALD cycles,...
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