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The influence of some process parameters of sputter ion plating on the deposition of tungsten on chemical vapour deposition (CVD) grown diamond wafers has been investigated. Direct deposition will give stressed films with bad adhesion. The level of stress can be reduced by moving the substrate away from direct ion bombardment. Further improvement in adhesion has been achieved following treatment with...
In recent years technologies based on physical and chemical vapour deposition (PVD and CVD) have had a significant impact on the performance of a range of products including cutting tools, aircraft and automotive parts, decorative and electronic products. However, it is envisaged that further improvements in material properties and hence improved product performance will only be likely if these processes...
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