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The origin of instability of p-Cu2O films deposited on a platinized Si substrate when used as photocathode in photoelectrochemical water splitting, was studied in the absence or presence of a protective layer of RuO2. When applied at +0.3V vs. RHE and at pH 7, p-Cu2O films were found to show a slightly more stable performance as compared to photoelectrochemical measurements reported in the literature...