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Amorphous hydrogenated carbon nitride layers, a-C:N:H, amorphous hydrogenated silicon nitride layers, a-SiNx:H and amorphous hydrogenated silicon carbonitride, a-SiCxNy:H, layers, fabricated on borosilicate glass and (001) oriented Czochralski silicon wafers by plasma assisted chemical vapour deposition, 13.56 MHz, were compared in this study. For reliable comparison the processing parameters, except...