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Boron-doped ultrananocrystalline diamond (UNCD) films were fabricated on silicon substrates by microwave plasma chemical vapor deposition. UNCD films containing different concentrations of boron were prepared by using trimethylboron (B(CH3)3, TMB) as boron doping source and varying the amount of boron in the gas mixture from 0 ppm to 1000 ppm. The effects of boron doping on morphology, lattice parameter,...
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