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W pracy przedstawiamy wzrost nanodrutów ZnO metodą osadzania warstw atomowych ALD (ang. Atomic Layer Deposition). Do otrzymania nanodrutów ZnO użyto podtoże GaAs pokryte mieszaniną złota i galu uformowanego na powierzchni w postaci rozseparowanych "nanokul". W procesie ALD jako prekursor tlenowy została użyta woda dejonizowana, natomiast jako prekursor cynkowy został użyty chlorek cynku...
Set the date range to filter the displayed results. You can set a starting date, ending date or both. You can enter the dates manually or choose them from the calendar.