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The hydrogen plasma characteristics in an electron cyclotron resonance chemical vapor deposition (ECR-CVD) system has been investigated using a Langmuir Probe and optical emission spectroscopy (OES). Our results show that the electron energy drops sharply as the microwave power increases from 200 to 400W, except at the center of the chamber. It remained relatively unchanged from 400 to 1000W, and...
The deposition of hydrogenated amorphous carbon (a-C:H) films from a mixture of hydrogen and methane using the electron cyclotron resonance chemical vapour deposition (ECR-CVD) method is reported. A screen grid positioned above the substrate was used to provide an electric field to accelerate the ions towards the substrate during deposition. The structural characteristics of the a-C:H films have been...
This paper reports the deposition of hydrogenated silicon carbide (SiC:H) films using the electron cyclotron resonance chemical vapour deposition (ECR-CVD) technique. Using this technique, SiC:H films were prepared from a mixture of methane, silane and hydrogen, with phosphine as the doping gas. The effects of changing the phosphine fraction on the optical bandgap, activation energy and conductivity...
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